SEM image of Tungsten probe tipMicro- and nano-scale multi-probing techniques are used in semiconductor device R&D and production to probe sample surfaces, as when measuring the surface electrical characteristics for failure analysis. With the increasing intricacy of device structures in recent years, higher demands are placed on probe specifications such as increased sharpness and control of surface oxide films. Demand for such probes is also increasing in various other fields, including nanobiology.
To meet these needs, UNISOKU has developed contact inspection nanoprobes for a variety of applications.
Go to 'Line-up of Probes for STM and Multi-Probe Electrical Measurement' Page