Accessories for SPM
Ion Sputter Gun IB-201
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Ion Sputter Gun IB-201 is the ideal solution for sputter cleaning of samples under UHV.
Beam Energy | 0.5–2 kV |
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Emission Current | 0–30 mA |
At 25mm Working Distance | 2.5 mm FWHM |
At 50mm Working Distance | 3.5 mm FWHM |
Flange Size | Φ ICF70 |
Maximum Total Target Current | 10 µA at VB = 2 kV |
Basic Components | 1 Ion Sputter Gun |
1 Controller Electronics | |
1 Cable |
Electro-Chemical Etching System for STM tip UTE-1001
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Sharpens the tip by electrochemical Etching for STM.
Input Power | AC 100V 50/60 Hz |
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Voltage Setting | DC 0–12 V |
Stop Current | 0–3 mA |
Tip Material | Tungsten (Φ 0.3 mm) |
Tip Curvature Radius | tens of nano meter |
Basic Components | 1 Main Unit |
1 Power Supply | |
1 Cable | |
1 Electrochemical Cell | |
1 Cell Table | |
1 Set of Accessories | |
2 Nipple Bulbs (2.2 V) | |
3 Tungsten Wires (f 0.3 mm × 30 mm) |
K-Cell Evaporator U100-1000
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Knudsen Cell evaporator heats and deposits the material on the target surface in UHV. The temperature range is from 300°C to 1000°C.
Heater | Φ 0.5 mm tungsten |
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Flange Size | Φ ICF70 mm |
Thermo-Couple | Almelu-cromel |
Crucible Capacity | Max. 0.3 cc |
Operating Temperature | 300–1000°C |
Allowable Current | 11 A |
Basic Components | 1 Main Unit |
1 Cable with thermo-couple wire (Exclusive cable for U100-1000) | |
1 Crucible (Excluded the power supply and the temperature regulator) |