Advanced HV-STM System HS-1000
Advanced HV-STM SystemHS-1000
Simple design
Easy to use
Wide applications
Superior cost performance
AFM measurement function addition
Surface observation with high resolution is possible only in the high vacuum condition. The high end technology of UNISOKU is condensed into this compact designed system which realize many functions of operations and applications to wide variety of sample materials.
Application
| STM observation metal, semiconductor, conductive materials, organic films and molecules on a conductive substrates. |
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Specification of Advanced HV-STM System HS-1000
| Observation and preparation chamber |
| Chamber | Stainless Steel 203mmφ (electro polished) |
| Vacuum | 2×10-6 Pa |
| Maximum Scan range | XY 4µm2, Z 300nm |
| Resolution | XY 0.1nm, Z 0.02nm |
| Sample heating | Ohmic heating function (at preparation position) |
| Load-lock chamber |
| Chamber | Stainless Steel 70mmφ (electro polished) |
| STM controller |
| Feedback | Digital I control |
| Minimum current detection | 1pA |
| OS | Windows XP Professional |
| Standard accessories |
Fig. HS-1000 System Front View
* The table under the STM controller is not included in this system configuration.
Options
| AFM |
| MFM |
| KFM |
| Pump unit for ultra high vacuum |
| In situ Ar sputter function |
| In situ deposition of inorganic and organic materials |
| Light illumination to sample surface |
| Tip cleaning by electron beam heating |